LEADER 00000cam a2200613Li 4500 
001    ocn893677848 
003    OCoLC 
005    20160527041120.4 
006    m     o  d         
007    cr cn||||||||| 
008    141016t20142014sz a    ob    101 0 eng d 
020    9783038266266|q(electronic book) 
020    3038266264|q(electronic book) 
020    |z9783038352426 
035    (OCoLC)893677848 
040    E7B|beng|erda|epn|cE7B|dOCLCO|dN$T|dCUS|dOCLCO|dEBLCP
       |dOCLCF|dYDXCP|dDEBSZ|dOCLCO|dOCLCQ|dOCLCO|dOCL|dOCLCO
       |dLLB 
049    RIDW 
050  4 TK7871.85|b.I584 2014eb 
072  7 TEC|x009070|2bisacsh 
082 04 621.38152|223 
090    TK7871.85|b.I584 2014eb 
111 2  International Symposium on Ultra Clean Processing of 
       Semiconductor Surfaces|n(12th :|d2014 :|cBrussels, 
       Belgium)|0https://id.loc.gov/authorities/names/
       nb2015004630 
245 10 Ultra clean processing of semiconductor surfaces XII :
       |bselected, peer reviewed papers from the 12th 
       International Symposium on Ultra Clean Processing of 
       Semiconductor Surfaces (UCPSS) September 21-24, 2014, 
       Brussels, Belgium /|cedited by Paul Mertens, Marc Meuris 
       and Marc Heyns. 
264  1 Pfaffikon, Switzerland :|bTTP,|c2014. 
264  2 Enfield, New Hampshire :|bTrans Tech Publications Ltd,
       |c[date of distribution not identified] 
264  4 |c©2014 
300    1 online resource (331 pages) :|billustrations. 
336    text|btxt|2rdacontent 
337    computer|bc|2rdamedia 
338    online resource|bcr|2rdacarrier 
340    |gpolychrome|2rdacc 
347    text file|2rdaft 
490 1  Solid State Phenomena,|x1662-7799 ;|vVolume 219 
504    Includes bibliographical references at the end of each 
       chapters and index. 
520    Collection of selected, peer reviewed papers from the 12th
       International Symposium on Ultra Clean Processing of 
       Semiconductor Surfaces (UCPSS), September 21-24, 2014, 
       Brussels, Belgium. The 71 papers are grouped as follows: 
       Chapter 1: Cleaning for FEOL Applications,Chapter 2: 
       Cleaning for FEOL Applications: Beyond-Si Active Area, 
       Chapter 3: Wet Etching for FEOL Applications,Chapter 4: 
       Wet Processing of High Aspect Ratio Structures, Chapter 5:
       Fluid Dynamics, Cleaning Mechanics,Chapter 6: Photo Resist
       Performance and Rework, Chapter 7: Cleaning for BEOL 
       Interconnect Applications, Chapter 8: Cleaning for 3D 
       Applications, Chapter 9: Contamination Control and AMC,
       Chapter 10: Cleaning and Wet Etching for Semiconductor 
       Photo-Voltaic Cells Keyword: Ultra-cleaning, precision 
       cleaning, wet cleaning, Semiconductor Surfaces, 
       contamination control, surface impurities, surface defects,
       Integrated circuits, Micro-electronic structures, 
       photovoltaic processing, proceedings UCPSS. 
588 0  Online resource; title from PDF title page (ebrary, viewed
       October 16, 2014). 
590    eBooks on EBSCOhost|bEBSCO eBook Subscription Academic 
       Collection - North America 
650  0 Semiconductors|vCongresses.|0https://id.loc.gov/
       authorities/subjects/sh2008111509 
650  7 Semiconductors.|2fast|0https://id.worldcat.org/fast/
       1112198 
655  4 Electronic books. 
655  7 Conference papers and proceedings.|2fast|0https://
       id.worldcat.org/fast/1423772 
655  7 Conference papers and proceedings.|2lcgft|0https://
       id.loc.gov/authorities/genreForms/gf2014026068 
700 1  Mertens, Paul,|0https://id.loc.gov/authorities/names/
       nr2002012447|eeditor. 
700 1  Meuris, Marc,|0https://id.loc.gov/authorities/names/
       nr2002012448|eeditor. 
700 1  Heyns, Marc,|0https://id.loc.gov/authorities/names/
       nr2002012446|eeditor. 
776 08 |iPrint version:|aInternational Symposium on Ultra Clean 
       Processing of Semiconductor Surfaces (12th : 2014 : 
       Brussels, Belgium).|tUltra clean processing of 
       semiconductor surfaces XII : selected, peer reviewed 
       papers from the 12th International Symposium on Ultra 
       Clean Processing of Semiconductor Surfaces (UCPSS) 
       September 21-24, 2014, Brussels, Belgium.|dPfaffikon, 
       Switzerland : TTP, ©2014|h333 pages|kDiffusion and defect 
       data. Pt. B, Solid state phenomena ; Volume 219
       |z9783038352426 
830  0 Diffusion and defect data.|nPt. B,|pSolid state phenomena 
       ;|0https://id.loc.gov/authorities/names/no00104273|vv. 
       219. 
856 40 |uhttps://rider.idm.oclc.org/login?url=http://
       search.ebscohost.com/login.aspx?direct=true&scope=site&
       db=nlebk&AN=862221|zOnline eBook. Access restricted to 
       current Rider University students, faculty, and staff. 
856 42 |3Instructions for reading/downloading this eBook|uhttp://
       guides.rider.edu/ebooks/ebsco 
901    MARCIVE 20231220 
948    |d20160607|cEBSCO|tebscoebooksacademic|lridw 
994    92|bRID