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LEADER 00000cam a2200733Ka 4500 
001    ocn824699045 
003    OCoLC 
005    20160527041720.1 
006    m     o  d         
007    cr cnu---unuuu 
008    130121s2000    si a    ob    101 0 eng d 
020    9789812792136|q(electronic book) 
020    9812792139|q(electronic book) 
020    |z9810244525 
020    |z9789810244521 
035    (OCoLC)824699045 
040    N$T|beng|epn|cN$T|dOCLCO|dE7B|dI9W|dOCLCF|dOCLCO|dYDXCP
       |dOCL|dOCLCO|dEBLCP|dOCLCQ|dOCLCO|dOCLCQ 
049    RIDW 
050  4 QD181.S6|bI58 1999eb 
072  7 SCI|x013030|2bisacsh 
082 04 546/.6832|222 
084    UP 3100|2rvk 
090    QD181.S6|bI58 1999eb 
111 2  International School of Solid State Physics|0https://
       id.loc.gov/authorities/names/no2001061002|n(16th :|d1999 :
       |cErice, Italy) 
245 10 Silicides :|bfundamentals and applications : proceedings 
       of the 16th Course of the International School of Solid 
       State Physics, Erice, Italy, 5-16 June 1999 /|ceditors, 
       Leo Miglio & Francois d'Heurle. 
246 18 Silicides, fundamentals and applications 
246 30 16th Course of the International School of Solid State 
       Physics 
264  1 Singapore ;|aRiver Edge, NJ :|bWorld Scientific,|c[2000] 
264  4 |c©2000 
300    1 online resource (viii, 377 pages) :|billustrations. 
336    text|btxt|2rdacontent 
337    computer|bc|2rdamedia 
338    online resource|bcr|2rdacarrier 
340    |gpolychrome|2rdacc 
347    text file|2rdaft 
490 1  The science and culture series. Materials science ;|v1 
504    Includes bibliographical references and index. 
505 0  Crystal chemistry of metal silicides / R. Madar -- 
       Structural features of binary transition metal silicides /
       I. Engstrom -- Bonding and polymorphism in transition 
       metal disilicides / L. Miglio, M. Iannuzzi and D. Migas --
       Diffusion in silicides: basic approach and practical 
       applications / P. Gas and F.M. d'Heurle -- Silicides and 
       thermodynamics / C. Bernard and A. Pisch -- Optical 
       properties of silicides: theory and experiment / V. 
       Antonov and F. Marabelli -- Electronic structure [symbol] 
       / K. Goransson -- Ion beam synthesized [symbol] 
       precipitates in Si: structural characterization and origin
       of the 1.54 pm luminescence / M.G. Grimaldi, S. Coffa and 
       C. Spinella -- Optical characterization of [symbol] / W. 
       Henrion [and others] -- Fundamental electronic properties 
       of semiconducting silicides / V. Borisenko -- 
       Semiconducting silicides -- thermoelectric properties and 
       applications / A. Heinrich -- Metallic silicides / G. 
       Ottaviani -- Conversion electron Mossbauer spectroscopy 
       study of iron disilicide / M. Fanciulli -- The kinetics of
       reactive phase formation: silicides / F.M. d'Heurle -- 
       Reactive phase formation in binary and ternary silicide 
       systems / A.A. Kodentsov [and others] -- Epitaxial 
       silicides / H. von Kanel -- Ion bean synthesis, molecular 
       beam allotaxy and self-assembled patterning of epitaxial 
       silicides / S. Mantl -- Silicides: materials science and 
       applications for microelectronics / K. Maex and A. Lauwers
       -- Mechanisms for enhanced formation of the C54 phase of 
       titanium silicides / J.M.E. Harper [and others] -- 
       Titanium and tungsten silicides in silicon device 
       technology / G. Queirolo -- Micro-Raman spectroscopy 
       applied to microelectronics: the phase transition of 
       [symbol] from C49 to C54 / S. Quilici -- Stresses in 
       silicides thin films obtained by solid state reaction / P.
       Gergaud [and others] -- The changing views on the Schottky
       barrier / R. Tung -- Internal photoemission spectroscopy 
       for a [symbol] Schottky junction / B. Asian and R. Turan -
       - Metal rich structural silicides / A.J. Thorn [and 
       others] -- The epitaxy of [symbol] on Si substrates: a 
       review / S.-L. Zhang and F.M. d'Heurle -- Agglomeration of
       cobalt disilicide on silicon / A. Alberti, L. Kappius and 
       F.M. d'Heurle. 
520    Silicides were introduced into the technology of 
       electronic devices some thirty years ago; since then, they
       have been continuously used to form both ohmic and 
       rectifying contacts to silicon. Silicides are also 
       important for other applications (thermoelectric devices 
       and structural applications, such as jet engines), but it 
       is not easy to find an updated reference containing both 
       their basic properties, either chemical or physical, and 
       the latest applications. The 16th Course of the 
       International School of Solid State Physics, held in Erice
       (Italy) in the late spring of 1999, was intended to break 
       artificial barriers between disciplines, and to gather 
       people concerned with the properties and applications of 
       silicides, regardless of the formal fields to which they 
       belong, or of the practical goals they pursue. This book 
       is therefore concerned with theory as well as applications,
       metallurgy as well as physics, and materials science as 
       well as microelectronics. 
588 0  Print version record. 
590    eBooks on EBSCOhost|bEBSCO eBook Subscription Academic 
       Collection - North America 
650  0 Silicides|0https://id.loc.gov/authorities/subjects/
       sh85122509|vCongresses.|0https://id.loc.gov/authorities/
       subjects/sh99001533 
650  0 Electronics|xMaterials|vCongresses.|0https://id.loc.gov/
       authorities/subjects/sh2008102950 
650  0 Integrated circuits|vCongresses.|0https://id.loc.gov/
       authorities/subjects/sh2008104261 
650  0 Thin films|vCongresses.|0https://id.loc.gov/authorities/
       subjects/sh2008112885 
650  7 Silicides.|2fast|0https://id.worldcat.org/fast/1118627 
650  7 Electronics|xMaterials.|2fast|0https://id.worldcat.org/
       fast/907562 
650  7 Integrated circuits.|2fast|0https://id.worldcat.org/fast/
       975535 
650  7 Thin films.|2fast|0https://id.worldcat.org/fast/1150018 
655  4 Electronic books. 
655  7 Conference papers and proceedings.|2fast|0https://
       id.worldcat.org/fast/1423772 
655  7 Erice (1999)|2swd 
655  7 Conference papers and proceedings.|2lcgft|0https://
       id.loc.gov/authorities/genreForms/gf2014026068 
700 1  Miglio, L.|0https://id.loc.gov/authorities/names/n93062668
700 1  D'Heurle, F. M.|0https://id.loc.gov/authorities/names/
       no2001061004 
776 08 |iPrint version:|aInternational School of Solid State 
       Physics (16th : 1999 : Erice, Italy).|tSilicides.
       |dSingapore ; River Edge, NJ : World Scientific, ©2000
       |z9810244525|w(DLC)  2001280362|w(OCoLC)48642830 
830  0 Science and culture series (Singapore).|pMaterials science
       ;|0https://id.loc.gov/authorities/names/no2001041558|v1. 
856 40 |uhttps://rider.idm.oclc.org/login?url=http://
       search.ebscohost.com/login.aspx?direct=true&scope=site&
       db=nlebk&AN=514223|zOnline eBook. Access restricted to 
       current Rider University students, faculty, and staff. 
856 42 |3Instructions for reading/downloading this eBook|uhttp://
       guides.rider.edu/ebooks/ebsco 
901    MARCIVE 20231220 
948    |d20160607|cEBSCO|tebscoebooksacademic|lridw 
994    92|bRID